Ni-B 합금도금층의 전착거동 및 열적 특성에 관한 연구
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In this study, the electrodeposition behavior and the thermal characteristics of deposited layer of Ni-B alloy were investigated. Boron content of deposited layer of Ni-B alloy increased with increasing the concentration of TMAB(trimethylamine borane), bath temperature and pH. As boron content of deposited layer increased, the grain size was refined and the deposited layer of Ni-B alloy was shown an amorphous structure at 11 at% B. The band structure was shown in the cross-section of deposited layer due to a relative composition difference of boron content after galvanic corrosion process. Deposited layer of Ni-B alloy was shown the maximum hardness of Hv 1254 in the conditions of the heat-treatment temperature of 300℃ and the boron content of 11 at%. When deposited layers of Ni-B alloy having 2, 6 at% B and 9, 11 at% B were heat-treated at 370℃, 300℃ respectively, Ni₃B intermetallic compound was precipitated. Deposited layer of Ni-6 at% B heat-treated at 370℃ showed almost the ring pattern of nanocrystalline Ni and the spot pattern of Ni₃B(001) zone dispersed on Ni matrix. Deposited layer of Ni-11 at% B heat-treated at 300℃ showed the spot pattern of Ni and double diffraction spots of Ni₃B(110) zone.