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Fabrication of nanostructure by nanoprobe-based lithography
iv, 47 p.
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We fabricated nanostructures of various shapes by nanoprobe which was covered with organic molecules, ODT (1-octadecanethiol), HDT (1.6-hexanedithiol), and MHA (16-mercaptohexadecanoic acid). This method (Dip-Pen Nanolithography) that allows the chemistry to be controlled on the 1-100 nm length scale is a fundamental and exciting challenge on nanoscience and nanotechnology because it opens new possibilities in fields ranging from molecular electronics to catalysis. In this study, we did three works with using this method. First, controlled patterning of hexanedithiol was formed on Au surface using a direct patterning with SPM (Scanning Probe Microcope). A pattern of nanoparticles was fabricated using the ends of hexanedithiol molecules in which one makes a stable chemical bond onto Au nanoparticle whereas the other end does onto the substrate. Second, we did the generation of multicomponent nanostructures by DPN and show that chemically pristine patterns of multiple different materials can be generated with near perfect alignment and 100 nm separation. Finally, arbitrary molecular patterns defined by the DPN were used as a mask against a series of chemical etching to produce various nanostructures on a solid surface. Line-width of thus generated nanostructure was about a few tens of nanometers, which was strongly dependent upon the DPN parameters like molecular weight of the mask molecule, writing velocity, and the number of repetition, while the humidity and temperature during the DPN only had a minor effect. By this method, gold and silicon nanowires with a line-width of around 20 nm were readily formed on semiconducting or insulating surfaces, which should be useful in generating nano-scaled transistors and sensors.