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MPC Based Feedforward Trajectory for Pulling Speed Tracking Control in the Commercial Czochralski Crystallization Process

Lee Kihong    (School of Chemical Engineering and Technology, Yeungnam University   ); Lee Dongki    (School of Chemical Engineering and Technology, Yeungnam University   ); Park Jinguk    (LG Siltron Company   ); Lee Moonyong    (School of Chemical Engineering and Technology, Yeungnam University  );
  • 초록

    In this work, we propose a simple but efficient method to design a target temperature trajectory for pulling speed tracking control of the crystal grower in the Czochralski crystallization process. In the suggested method, the model predictive control strategy is used to incorporate the complex dynamic effect of the heater temperature on the pulling speed into the temperature trajectory design quantitatively. The feedforward trajectories designed by the proposed method were implemented on 200 mm and 300 mm silicon crystal growers in the commercial Czochralski process. The application results have demonstrated its excellent and consistent tracking performance of pulling speed along whole bulk crystal growth.


  • 주제어

    Czochralski crystallization process .   feedforward trajectory design .   model predictive control .   semi-conductor wafer .   silicon crystal control.  

  • 참고문헌 (8)

    1. M. A. Gevelber and G. Stephanopoulos, 'Dynamics and control of the Czochralski process,' Journal of Crystal Growth, vol. 84, no. 4, pp. 647-668, 1987 
    2. K. S. Lee, J. H. Lee, I. Chin, and H. J. Lee, 'A model predictive control technique for batch processes and its application to temperature tracking control of an experimental batch reactor,' AIChE Journal, vol. 45, no. 10, pp. 2175-2187, 1999 
    3. M. A. Gevelber, M. J. Wargo, and G. Stephanopoulos, 'Advanced control design considerations for the Czochralski process,' Journal of Crystal Growth, vol. 85, no. 1-2, pp. 256-263, 1987 
    4. K. S. Lee and J. H. Lee, 'A generic framework for integrated quality and profile control for industrial batch processes,' Proc. of 6th IFAC Symp. on DYCOPS, pp. 59-70, June 2001 
    5. K. S. Lee, J. Lee, I. Chin, J. Choi, and J. H. Lee, 'Control of wafer temperature uniformity in rapid thermal processing using an optimal iterative learning control technique,' Industrial & Engineering Chemistry Research, vol. 40, no. 7, pp. 1661-1672, 2001 
    6. R. I. Rivera and W. D. Seider, 'Model predictive control of the Czochralski crystallization process,' Journal of Crystal Growth, vol. 178, no. 4, pp. 593-611, 1997 
    7. K. M. Kim, 'Growing improved silicon crystals for VLSI/ULSI applications,' Solid State Technology, Pennwell Publication Co., Nov. 1996 
    8. C. R. Cutler and B. L. Ramaker, 'Dynamic matrix control: a computer control algorithm,' Prof. of 86th AIChE National Meeting, April 1979 

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