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Journal of microscopy v.265 no.3, 2017년, pp.307 - 312   SCI SCIE
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Matrices pattern using FIB; 'Out‐of‐the‐box' way of thinking

FLEGER, Y. (Institute of Nanotechnology and Advanced Materials, Bar‐Ilan University, Ramat Gan, Israel ) ; GOTLIB‐VAINSHTEIN, K. (Institute of Nanotechnology and Advanced Materials, Bar‐Ilan University, Ramat Gan, Israel ) ; TALYOSEF, Y. (Institute of Nanotechnology and Advanced Materials, Bar‐Ilan University, Ramat Gan, Israel ) ;
  • 초록  

    Summary Focused ion beam (FIB) is an extremely valuable tool in nanopatterning and nanofabrication for potentially high‐resolution patterning, especially when refers to He ion beam microscopy. The work presented here demonstrates an ‘out‐of‐the‐box’ method of writing using FIB, which enables creating very large matrices, up to the beam‐shift limitation, in short times and with high accuracy unachievable by any other writing technique. The new method allows combining different shapes in nanometric dimensions and high resolutions for wide ranges.


    Lay description Today, the world is going to the smallest technologies which can be created. The behaviour of the materials in the nanolevel is getting a high and intense interest. Changing materials properties using different pattern is one of the powerful tool to control electrical and optical properties. The control over those properties has to be accompanied with the technology which able to create such tiny patterns with high accuracy, reproducibility and resolution. We propose an elegant method to create nanopatterns, such as matrices, within a short time while preventing the possible misalignments that can influence the material's behaviour. Our method is taking forward the standard FIB (focused ion beam) writing. With the described method, one can create sophisticated nanostructures on different materials without hard computing work and fancy software and with high accuracy.


  • 주제어

    FIB .   He ion beam microscopy .   nanopatterning.  

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